Manufacturing Platform for High-Performance MEMS Inertial Sensors

J. DeNatale, P. Stupar, S. Martel, J. Lachance
{"title":"Manufacturing Platform for High-Performance MEMS Inertial Sensors","authors":"J. DeNatale, P. Stupar, S. Martel, J. Lachance","doi":"10.1109/PLANS53410.2023.10140045","DOIUrl":null,"url":null,"abstract":"We present recent progress on a high-performance inertial sensor manufacturing processes implemented in a volume compatible 200 mm wafer diameter production environment. The baseline process, derived from Teledyne DALSA's MIDIS™ process platform, incorporates critical design elements specifically designed for navigation-grade device realization. The process enables considerable flexibility to support a broad range of device designs, facilitating the rapid transition of new device concepts to volume production. Recent progress has demonstrated the flexibility of the process through application to alternate gyro resonator device designs. Extensive refinement of the process has been implemented to improve manufacturing metrics and device performance.","PeriodicalId":344794,"journal":{"name":"2023 IEEE/ION Position, Location and Navigation Symposium (PLANS)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-04-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE/ION Position, Location and Navigation Symposium (PLANS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLANS53410.2023.10140045","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

We present recent progress on a high-performance inertial sensor manufacturing processes implemented in a volume compatible 200 mm wafer diameter production environment. The baseline process, derived from Teledyne DALSA's MIDIS™ process platform, incorporates critical design elements specifically designed for navigation-grade device realization. The process enables considerable flexibility to support a broad range of device designs, facilitating the rapid transition of new device concepts to volume production. Recent progress has demonstrated the flexibility of the process through application to alternate gyro resonator device designs. Extensive refinement of the process has been implemented to improve manufacturing metrics and device performance.
高性能MEMS惯性传感器制造平台
我们介绍了在批量兼容的200毫米晶圆直径生产环境中实现的高性能惯性传感器制造工艺的最新进展。基线工艺源自Teledyne DALSA的MIDIS™工艺平台,结合了专门为导航级设备实现设计的关键设计元素。该工艺具有相当大的灵活性,可以支持广泛的设备设计,促进新设备概念向批量生产的快速过渡。最近的进展已经证明了该过程的灵活性,通过应用于备用陀螺谐振器装置的设计。已经实施了广泛的工艺改进,以提高制造指标和设备性能。
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