Wirebond enhancement on copper palladium bonding in a Over Pad Metalization

Michael B. Tabiera, B. C. Bacquian, Terencio D. Lacuesta
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Abstract

This paper presents the wire bonding enhancement for copper palladium (CuPd) wires on Nickel Palladium (NiPd) Over Pad Metallization (OPM) on bond pads of Power Management Device. The enhancement was done to minimize Non-Stick on Pad (NSOP) and further improvement on ball bond adhesion using 33um CuPd Wire. A Design of Experiment (DOE) was conducted for the Wire bond process Improvement to reduced NSOP occurrence. The DOE showed strong dependence on the Forming Gas Flow in the Chamber, E-torch and 3rd Nozzle to improved ball bond adhesion. The ball bond adhesion was measured through ball shear test (BST). The Forming Gas Flow optimization indicated the need to reduce chamber and E-torch flow by about 30% form current value used for Bare Copper wire. However the 3rd nozzle should be increased about 33%. This resulted to higher BST readings by 40% from the original readings. NSOP occurrence was still observed despite the wire bond process improvement. Process mapping was performed with the aid of an ISHIKAWA Diagram. The analysis indicated that poor bond pad property was the major contributor of NSOP. A detailed physical analysis of the bond pad showed thin Pd plating. The Pd thickness was verified through cross sectioning of the pads. The thickness was correlated and confirmed by manual cross sectioning, Focus Ion Beam (FIB) and depth profiling using Top of Flight Secondary Ion Mass Spectroscopy (TOFSIMS). NSOP occurrence was observed for Pd thickness of 200nm and below. Good bondability was obtained with Pd thickness above 300nm. Other bond pad manifestation was noted such as discoloration and rough/granulated bond pad surface. The discoloration and rough surface was due to the pronounced nickel structure underneath the thin Pd plating. Forming Gas Flow shows significant effect on ball bond adhesion but does not completely eliminate the NSOP occurrence. The bond pad morphology plays strong correlation on the NSOP occurrence.
超焊层金属化中铜钯键合的线键增强
本文介绍了在电源管理器件的键合盘上镀镍钯(NiPd)金属化(OPM)增强铜钯(CuPd)线的键合性能。通过使用33um的CuPd线,可以最大限度地减少焊盘不粘着(NSOP),并进一步提高球键的附着力。为减少NSOP的发生,对焊丝焊工艺进行了改进实验设计(DOE)。实验结果表明,成形腔内气体流量、e -炬和第三喷嘴对提高球粘接强度有很大的依赖性。采用球剪切试验(BST)测定球黏结力。成形气体流量优化表明,需要将腔室和e炬流量从裸铜线的电流值减少约30%。然而,第三个喷嘴应增加约33%。这导致BST读数比原始读数高40%。尽管焊丝工艺得到了改进,但仍观察到NSOP的发生。在ISHIKAWA图的帮助下进行了过程映射。分析表明,粘结垫性能差是造成NSOP的主要原因。对焊盘进行了详细的物理分析,发现镀层很薄。通过焊盘的横截面验证了Pd的厚度。通过人工横截面、聚焦离子束(FIB)和飞行顶二次离子质谱(TOFSIMS)的深度剖面进行了厚度的关联和确认。Pd厚度在200nm及以下时,出现了NSOP。Pd厚度在300nm以上时,具有良好的粘结性。其他粘结垫表现如变色和粘结垫表面粗糙/颗粒状。变色和粗糙的表面是由于在薄的Pd镀层下有明显的镍结构。成形气流量对球粘接有显著影响,但不能完全消除NSOP的发生。键垫形态与NSOP的发生有较强的相关性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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