Photon Counting Temperature Measurements During Pulsed Laser Heating of Al2O3-TiC Ceramics

T. M. Harms, Xianfan Xu
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Abstract

This work investigates photon-counting measurements during pulsed laser heating of an Al2O3-TiC substrate. The excitation source is a Nd:YAG laser operating at a fundamental wavelength of 1064 nm. The laser fluence is varied in the range from 0.272 J/cm2 to 0.839 J/cm2. The emission spectra, captured by single photon counting, are related to temperature by Planck’s distribution. The suitability of this method is discussed. Pulse exposure, the number of pulses that a given surface location receives, is found to be a vitally important parameter. Numerical simulations of transient heat conduction support the results of high pulse exposure measurements. Low pulse exposure experiments exhibit higher temperatures due to chemical reactions at the surface and grain boundary effects.
脉冲激光加热Al2O3-TiC陶瓷过程中的光子计数温度测量
本文研究了脉冲激光加热Al2O3-TiC衬底时的光子计数测量。激发源为工作波长为1064 nm的Nd:YAG激光器。激光通量在0.272 J/cm2 ~ 0.839 J/cm2之间变化。通过单光子计数捕获的发射光谱通过普朗克分布与温度相关。讨论了该方法的适用性。脉冲暴露,即给定表面位置接收到的脉冲数,被认为是一个至关重要的参数。瞬态热传导的数值模拟支持高脉冲暴露测量的结果。由于表面化学反应和晶界效应,低脉冲暴露实验显示出较高的温度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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