Single Event Latchup Cross Section Calculation from TCAD Simulations - Effects of the Doping Profiles and Anode to Cathode Spacing

S. Guagliardo, F. Wrobel, Y. Aguiar, J. Autran, P. Leroux, F. Saigné, V. Pouget, A. Touboul
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引用次数: 2

Abstract

In this paper SEL cross sections were calculated from TCAD simulations varying doping profiles, anode-to-cathode spacing and substrate and well taps placement values. We found that doping profiles and substrate and well taps placement variation has a stronger impact on SEL sensitivity then variation of anode to cathode spacing.
基于TCAD模拟的单事件闭锁截面计算-掺杂剖面和阳极阴极间距的影响
在本文中,通过TCAD模拟计算了不同掺杂剖面、阳极-阴极间距、衬底和井接头放置值的SEL横截面。我们发现,掺杂剖面、衬底和井头位置的变化对SEL灵敏度的影响比阳极阴极间距的变化更大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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