Impact of In flux on self-assembled InGaN/GaN superlattice grown on GaN template by plasma-assisted molecular beam epitaxy

K. Khan, K. Sun, C. Wurm, E. Ahmadi
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Abstract

We have previously reported spontanous formation of InGaN/GaN superlattice structure on nominal InGaN films grown by plasma-assisted molecular beam epitaxy (PAMBE). In this work, we report on the impact of In flux on the formation and periodicity of self-assembled InxGa1-xN/InyGa1-yN superlattice structure (SASL). We show that the thickness and In composition in the InGaN layer varies by changing the In flux. These films were stucturally characterized by X-ray diffraction and simulated by globalfit software to get the thickness and In composition. The superlattice structures were confimred by scanning transmission electron microscopy and the thickness of InGaN layer and In composition were determined by energy dispersive X-ray spectroscopy. This work can provide a method for using the SASL with better control for their optoelectronics application.
In通量对等离子体辅助分子束外延在GaN模板上生长的InGaN/GaN自组装超晶格的影响
我们以前报道过在等离子体辅助分子束外延(PAMBE)生长的InGaN薄膜上自发形成InGaN/GaN超晶格结构。在这项工作中,我们报道了In通量对自组装InxGa1-xN/InyGa1-yN超晶格结构(SASL)的形成和周期性的影响。我们发现,InGaN层的厚度和In成分随In通量的变化而变化。用x射线衍射对膜进行了结构表征,并用globalfit软件进行了模拟,得到了膜的厚度和组成。用扫描透射电镜对其超晶格结构进行了确证,并用能量色散x射线谱法测定了InGaN层的厚度和In的组成。这项工作可以为SASL的光电应用提供一种更好的控制方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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