Phonon-limited performance of single-layer, single-gate black phosphorus n- and p-type field-effect transistors

Á. Szabó, R. Rhyner, H. Carrillo-Nuñez, M. Luisier
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引用次数: 18

Abstract

Phosphorene is a novel 2-D material with a direct band gap and a high electron/hole mobility, which makes it attractive for logic applications. The theoretical investigations of such devices have so far lacked either one or both key ingredients of realistic simulations: a full-band description of the electronic states and the consideration of electron-phonon scattering. In this paper we present the first ab-initio quantum transport simulations of phosphorene transistors accounting for these effects. We show that the DOS bottleneck does not limit the performance of phosphorene FETs, that the armchair configuration takes advantage of its lower effective mass and higher mobility at gate lengths above 10 nm, but that these properties become an obstacle at shorter gate lengths. We also demonstrate that phosphorene FETs with 10 nm gate length outperform MoS2, regardless of the channel orientation.
单层单栅黑磷n型和p型场效应晶体管的声子限制性能
磷烯是一种新型的二维材料,具有直接带隙和高电子/空穴迁移率,这使得它在逻辑应用中具有吸引力。到目前为止,对这类器件的理论研究缺乏现实模拟的一个或两个关键因素:对电子状态的全波段描述和对电子-声子散射的考虑。在本文中,我们提出了第一个考虑这些效应的磷二烯晶体管的从头算量子输运模拟。我们发现DOS瓶颈并没有限制磷二烯场效应管的性能,扶手椅结构在栅极长度大于10 nm时具有较低的有效质量和较高的迁移率,但这些特性在栅极长度较短时成为障碍。我们还证明了具有10 nm栅极长度的磷二烯场效应管,无论沟道取向如何,其性能都优于MoS2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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