The Role and Mechanism of Fe-ion Bombardment in creating highly resistive InGaAs layers

S. C. Subramaniam, A. Rezazadeh
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引用次数: 1

Abstract

The electrical behavior of InGaAs following Fe-ion bombardment at 77K temperature in n- and p-type InGaAs structures have been investigated in this paper. Maximum resistivity of ~4times106 Omega/sq and ~7times106 Omega/sq at optimum annealing temperatures of ~250 and 600degC has been determined for p- and n-type InGaAs materials, respectively. These thermally stable high resistive regions in InGaAs due to Fe-ion bombardment are close to the intrinsic limit of InGaAs. Fe acceptor ionization energy of ~0.35 eV have been determined from temperature-dependant study. Good agreement has been observed between the experimental results and that of the physical model developed to observe the effects of Fe+ in InGaAs material
铁离子轰击在形成高阻InGaAs层中的作用和机理
本文研究了在77K温度下fe离子轰击InGaAs后n型和p型InGaAs结构的电学行为。在250℃和600℃的最佳退火温度下,p型和n型InGaAs材料的最大电阻率分别为~4倍106 ω /sq和~7倍106 ω /sq。由于铁离子轰击,InGaAs中这些热稳定的高阻区接近InGaAs的固有极限。通过温度依赖性研究,确定了~0.35 eV的铁受体电离能。实验结果与用于观察Fe+在InGaAs材料中作用的物理模型的结果吻合较好
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