Current transport in graphene tunnel field effect transistor for RF integrated circuits

M. Fahad, A. Srivastava, A. Sharma, C. Mayberry
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引用次数: 5

Abstract

In this work, an analytical current transport model of Graphene Nanoribbon (GNR) Tunnel Field Effect Transistor (T-FET) is presented considering drain source voltage (VDS), gate source voltage (VGS), carrier mobility (μ) and top gate dielectric (tOX). For a GNR width of 5nm at 0.275eV band gap, ON current of 1605 μA/μm is calculated with a very high ON/OFF current ratio of 107. Subthreshold slope of 7.07mV/decade is calculated from I-VGS transfer characteristics. Current saturation is observed for input voltage, VGS of 0.28V and beyond for varying VDS values. Performance of the proposed model is compared with the earlier published work and the projected 2011 ITRS MOSFET requirements and it is found that considering proper device geometry and input voltages, GNR T-FET can demonstrate seven times lower power dissipation and eight times higher intrinsic speed in the upper GHz range than in conventional CMOS technology.
射频集成电路用石墨烯隧道场效应晶体管的电流输运
本文建立了考虑漏源电压(VDS)、栅极电压(VGS)、载流子迁移率(μ)和顶栅极介电介质(tOX)的石墨烯纳米带(GNR)隧道场效应晶体管(T-FET)电流输运分析模型。当GNR宽度为5nm,带隙为0.275eV时,ON电流为1605 μA/μm, ON/OFF电流比高达107。根据I-VGS传输特性计算出7.07mV/ 10年的亚阈值斜率。对于输入电压,VGS为0.28V及以上的不同VDS值,观察到电流饱和。将所提出模型的性能与早期发表的工作和预计的2011年ITRS MOSFET要求进行比较,发现考虑适当的器件几何形状和输入电压,GNR T-FET在高GHz范围内比传统CMOS技术的功耗低7倍,固有速度高8倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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