Planar negative index materials in the far infrared regime

T. F. Gundogdu, N. Katsarakis, M. Kafesaki, G. Konstantinidis, C. Soukoulis, E. Ozbay
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Abstract

We demonstrate the occurrence of a negative refractive index regime in the far infrared range, ~2.4-3 THz. This is achieved by using transmission and reflection measurements under normal incidence in one and three layers of a mum-scale metamaterial consisting of pairs of short-slabs and continuous wires, fabricated by a photolithography procedure.
远红外波段的平面负折射率材料
我们证明了在远红外波段(~2.4-3太赫兹)出现负折射率区。这是通过使用一层和三层正常入射下的透射和反射测量来实现的,这种材料由一对短板和连续的电线组成,由光刻工艺制造。
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