A. Khlybov, D. Rodionov, A. Panteleev, P. Timoshenkov
{"title":"The Analysis of Power RF GaN Transistors Thermal Parameters in Pulse Mode","authors":"A. Khlybov, D. Rodionov, A. Panteleev, P. Timoshenkov","doi":"10.1109/ElConRus51938.2021.9396223","DOIUrl":null,"url":null,"abstract":"The achievements in GaN HEMT technologies allow manufacturing transistors with output power up to 1000W in pulse mode. Self-heating in the transistor channel is a limiting factor for device reliability. The ordinary value for transistor channel temperature is up to 200C. It’s important to know the transistor thermal mode to predict device capabilities. The device under test in this work is an RF GaN transistor on silicon substrate with 2.1mm overall device width. This paper contains the results of the research of high-power RF GaN transistors thermal phenomena in pulse mode.","PeriodicalId":447345,"journal":{"name":"2021 IEEE Conference of Russian Young Researchers in Electrical and Electronic Engineering (ElConRus)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-01-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE Conference of Russian Young Researchers in Electrical and Electronic Engineering (ElConRus)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ElConRus51938.2021.9396223","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The achievements in GaN HEMT technologies allow manufacturing transistors with output power up to 1000W in pulse mode. Self-heating in the transistor channel is a limiting factor for device reliability. The ordinary value for transistor channel temperature is up to 200C. It’s important to know the transistor thermal mode to predict device capabilities. The device under test in this work is an RF GaN transistor on silicon substrate with 2.1mm overall device width. This paper contains the results of the research of high-power RF GaN transistors thermal phenomena in pulse mode.
GaN HEMT技术的成就允许在脉冲模式下制造输出功率高达1000W的晶体管。晶体管通道中的自热是器件可靠性的限制因素。晶体管通道温度的正常值可达200℃。了解晶体管热模式对于预测器件性能非常重要。本工作中测试的器件是硅衬底上的RF GaN晶体管,器件总宽度为2.1mm。本文介绍了大功率射频氮化镓晶体管在脉冲模式下的热现象研究成果。