Local Adhesion of Diamond-Like Carbon Films Coated on Substrates in a Trench-shaped Cathode

M. Ohnishi, H. Nozaki, H. Osawa, K. Minaki, K. Kitajima, K. Yokota
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引用次数: 1

Abstract

A negative potential is applied to an object in plasma consisting of methane or acetylene in order to coat a solid thin film such as DLC (diamond-like-carbon) on a material surface. The method is called plasma-based ion implantation (PBII). Since mechanical objects commonly possess complex shapes, it may be difficult to coat DLC on them in a uniform manner. This non-uniformity in thickness has been studied in many papers, and it has been reported that it is improved by applying a pulse potential repeatedly to the coated material. Using a scratch test, we studied the local adhesion of DLC coated by PBII to SUS304 thin plates attached at several places in a trench-shaped cathode. We found that the adhesion gets greater, in order, for the plates at the side, the bottom of the groove in a trench, and the top of a trench. In order to explain the results, further studies are required
沟槽形阴极衬底上涂覆类金刚石碳膜的局部附着力
负电位应用于由甲烷或乙炔组成的等离子体中的物体,以便在材料表面涂上固体薄膜,如DLC(类金刚石碳)。这种方法被称为等离子体离子注入(PBII)。由于机械物体通常具有复杂的形状,因此很难以统一的方式在其上涂覆DLC。这种厚度的不均匀性已经在许多论文中进行了研究,并报道了通过对涂层材料反复施加脉冲电位可以改善这种不均匀性。通过划痕试验,研究了PBII涂层DLC与槽形阴极上多处附着的SUS304薄板的局部附着力。我们发现附着力变得更强,顺序是,在侧面的板,沟槽底部的板,沟槽顶部的板。为了解释这些结果,还需要进一步的研究
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