Single-pulse high-resolution x-ray contact microscopy with an advanced epoxy novolac resist

Abstract

We report on the use of an epoxy novolac chemically amplified photoresist, to get x-ray images of living biological species in the water window of soft x-rays. This photoresist response was at least two orders of magnitude 'faster' than the standard used PMMA in contact x-ray microscopy. Atomic force microscopy of the resist, relief images obtained with biological specimen masking, suggests a resolution better than 300 nm in lateral dimensions - the size of the cell flagellas - and 20 nm in depth profiles.