Impact of high-k dielectrics and spacer layers on the elctrical performance of symmetrical double gate MOSFETs

Abstract

In this paper, analytical models for threshold voltage Vt and subthreshold slope S for symmetric double gate MOSFETs with high-k dielectrics are proposed. Analytical approaches for predicting Vt and S are developed by considering effects of fringing electric field, interface trap charge density and sidewall spacers. The proposed model has been employed to calculate Vt, S and drain induced barrier lowering (DIBL) of DG MOSFETs with different gate dielectrics for various values of effective oxide thickness (EOT). Also the effect of sidewall spacers on Vt has been predicted. Accuracy of models has been verified by comparing analytical results obtained from proposed models with the reported simulated data.