248 nm lithography of 2D photonic crystal waveguide with proximity correction

Digest of the LEOS Summer Topical Meetings Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004. Pub Date : 2004-06-28 DOI:10.1109/LEOSST.2004.1338720

H. Teo, M. Yu, M. Doan, J. Singh, S. Singh, H. Sun, A. Liu

引用次数: 2

Abstract

This paper addresses the specific issue of optical proximity correction (OPC) used in large array pillar type two-dimensional photonic crystal fabrication by deep UV lithography for a nonsequential technique amenable for batch fabrication.

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近距离校正二维光子晶体波导的248nm光刻

本文讨论了利用深紫外光刻技术制造大阵列柱型二维光子晶体中光学接近校正(OPC)的具体问题，该技术是一种适合批量制造的非顺序技术。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of the LEOS Summer Topical Meetings Biophotonics/Optical Interconnects and VLSI Photonics/WBM Microcavities, 2004.

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