Doping and segregation effects in AlGaN systems

P. Bogusławski, J. Bernholc
{"title":"Doping and segregation effects in AlGaN systems","authors":"P. Bogusławski, J. Bernholc","doi":"10.1109/SIM.1998.785114","DOIUrl":null,"url":null,"abstract":"Doping properties of substitutional C, Si, Ge, Be, and Se impurities in wurtzite GaN and AlN are studied by quantum molecular dynamics. We investigate effects that potentially quench doping efficiency, namely the self-compensation and the compensation by native defects. We also predict a strong interfacial segregation of Se/sub N/, C/sub N/, and nitrogen vacancies at the AlN/GaN heterointerface towards the GaN layer.","PeriodicalId":253421,"journal":{"name":"Semiconducting and Insulating Materials 1998. Proceedings of the 10th Conference on Semiconducting and Insulating Materials (SIMC-X) (Cat. No.98CH36159)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconducting and Insulating Materials 1998. Proceedings of the 10th Conference on Semiconducting and Insulating Materials (SIMC-X) (Cat. No.98CH36159)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIM.1998.785114","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Doping properties of substitutional C, Si, Ge, Be, and Se impurities in wurtzite GaN and AlN are studied by quantum molecular dynamics. We investigate effects that potentially quench doping efficiency, namely the self-compensation and the compensation by native defects. We also predict a strong interfacial segregation of Se/sub N/, C/sub N/, and nitrogen vacancies at the AlN/GaN heterointerface towards the GaN layer.
AlGaN体系中的掺杂和偏析效应
采用量子分子动力学方法研究了取代型C、Si、Ge、Be和Se杂质在纤锌矿GaN和AlN中的掺杂性质。我们研究了可能抑制掺杂效率的效应,即自补偿和原生缺陷补偿。我们还预测,在AlN/GaN异质界面上,向GaN层存在强烈的Se/sub N/、C/sub N/和氮空位的界面偏析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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