Process and device simulation at Harris Semiconductor

R. Lowther
{"title":"Process and device simulation at Harris Semiconductor","authors":"R. Lowther","doi":"10.1109/UGIM.1991.148141","DOIUrl":null,"url":null,"abstract":"The state of the art in the field of process and device simulation at Harris Semiconductor, universities, and vendors is reviewed. Particular emphasis is on interrelationships between these groups and between the supporters of the simulation tools at Harris and Harris process/device designers. Simulation of one of the advanced processes is discussed in detail to show how important simulation has become to process development and to illustrate many of the points discussed. Availability of the source code to the companies has allowed Harris programmers to make several incremental improvements at user's request in the time needed. Some of these enhancements are also discussed.<<ETX>>","PeriodicalId":163406,"journal":{"name":"Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UGIM.1991.148141","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The state of the art in the field of process and device simulation at Harris Semiconductor, universities, and vendors is reviewed. Particular emphasis is on interrelationships between these groups and between the supporters of the simulation tools at Harris and Harris process/device designers. Simulation of one of the advanced processes is discussed in detail to show how important simulation has become to process development and to illustrate many of the points discussed. Availability of the source code to the companies has allowed Harris programmers to make several incremental improvements at user's request in the time needed. Some of these enhancements are also discussed.<>
哈里斯半导体的工艺和器件仿真
回顾了哈里斯半导体、大学和供应商在过程和器件仿真领域的最新进展。特别强调的是这些小组之间的相互关系,以及哈里斯模拟工具的支持者和哈里斯工艺/设备设计师之间的相互关系。详细讨论了其中一个高级过程的仿真,以显示仿真对过程开发的重要性,并举例说明所讨论的许多要点。源代码对公司的可用性允许Harris程序员在需要的时间内根据用户的要求进行一些增量改进。本文还讨论了其中的一些增强
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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