BEOL-Compatible Multiple Metal-Ferroelectric-Metal (m-MFM) FETs Designed for Low Voltage (2.5 V), High Density, and Excellent Reliability

Mengyao Yan, Ming-Hung Wu, Hsin-Hui Huang, Yu-Hao Chen, Y. Chu, Tian-Li Wu, P. Yeh, Chih-Yao Wang, Yu-De Lin, Jian-Wei Su, P. Tzeng, S. Sheu, W. Lo, Chih-I Wu, T. Hou
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引用次数: 10

Abstract

An experiment-calibrated SPICE model considering dynamic ferroelectric switching and charge injection is established to co-optimize memory window, write speed, endurance, and retention of MFMFET where a standard BEOL HfZrOx MFM capacitor is stacked on top of the logic transistor. This promising SOC-compatible, low-power and low-voltage embedded memory achieves a high current on-off ratio > 104 when programming at ±2.5 V for 3 μs without compromising 10-year retention and MFM-equivalent endurance. A novel m-MFMFET utilizing multiple MFMs is also proposed. m-MFMFET achieves equivalent performance as the standard MFMFET but further reduces the unit cell size by 22 %.
beol兼容多金属-铁电-金属(m-MFM)场效应管设计低电压(2.5 V),高密度,卓越的可靠性
建立了一个考虑动态铁电开关和电荷注入的实验校准SPICE模型,以共同优化MFMFET的存储窗口、写入速度、持久时间和保持时间,其中标准BEOL HfZrOx MFM电容器堆叠在逻辑晶体管的顶部。这种有前途的soc兼容、低功耗和低电压嵌入式存储器在±2.5 V下编程3 μs时实现了> 104的高电流通断比,而不会影响10年的保留和mfm等效的耐用性。并提出了一种利用多个MFMs的新型m-MFMFET。m- mfmffet达到了与标准mfmffet相当的性能,但进一步减少了22%的单位电池尺寸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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