Band structure and optical properties of pseudomorphic Ge1−x−ySixSny on Ge

N. Fernando, Ryan Hickey, John Hart, R. Hazbun, Dainan Zhang, J. Kolodzey, Stefan Zollner
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Abstract

Ge is an indirect band gap material. The band structure of Ge is a strong function of strain and alloy composition, and a transition from an indirect to a direct band gap has been observed for y~6-10% for relaxed Ge1_ySny indicating the possibility of widespread applications of Ge-based photonic devices. The pseudomorphic nature of the Ge-based alloy layer on a substrate is important to keep dislocation densities low at the interface to improve the performance of the device. Band gap engineering of Ge by controlling strain and alloying with Si and Sn has attracted great interest since Ge1-x-ySixSny ternary alloy with two compositional degrees of freedom allows decoupling of the lattice constant and electronic structures. Hence the knowledge of the compositional and strain dependence of the Ge1-x-ySixSny band structure is critical for the design of photonic devices with the desired interband transition energies.
伪晶Ge1−x−ySixSny在Ge上的能带结构和光学性质
锗是一种间接带隙材料。Ge的能带结构是应变和合金成分的强烈函数,并且在y~6-10%的弛豫Ge1_ySny中观察到从间接带隙到直接带隙的转变,这表明了Ge基光子器件广泛应用的可能性。基板上的锗基合金层的伪晶性质对于保持低界面位错密度以提高器件性能非常重要。由于具有两个组成自由度的Ge1-x-ySixSny三元合金可以实现晶格常数和电子结构的解耦,通过控制应变和与Si和Sn合金化的Ge带隙工程引起了人们的极大兴趣。因此,了解Ge1-x-ySixSny带结构的成分和应变依赖关系对于设计具有所需带间跃迁能量的光子器件至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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