Physico-chemical characterization and study of nonlinear optical properties of tin and fluoride doped indium oxide thin films deposed by spray pyrolysis

F. N. Fellahi, M. Addou, M. A. Lamrani, T. E. Habbani, Z. Sofiani, M. E. Jouad, K. Bahedi, L. Dghoughi, B. Sahraoui, N. Gaumer, André Monteil
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Abstract

The thin films of undoped oxide indium and doped oxide indium by fluorine and tin were prepared by SPRAY pyrolysis. These layers were deposited on glass substrates from the Indium chloride (InCl3), tin chloride (SnCl2;2H2O) and ammonium fluoride (NH4F).The microstructure, morphological, optical transmittance and chemical composition of these layers were studied by the X ray diffraction (XRD), the scanning electron microscopy(SEM), atomic force microscopy (AFM) and microanalysis (EDX) respectively. A study of luminescence by cathodoluminescence technique and a study of nonlinear susceptibility of the third order by the third harmonic generation (THG) technique of these thin films were carried out. The aim of our study is the optimization of luminescence as well as the non-linear response to a possible application in optoelectronics as transparent conductive electrode or in microelectronics fields.
喷雾热解法制备锡氟掺杂氧化铟薄膜的理化表征及非线性光学性质研究
采用喷雾热解法制备了未掺杂氧化铟和氟锡掺杂氧化铟薄膜。这些层是由氯化铟(InCl3)、氯化锡(SnCl2;2H2O)和氟化铵(NH4F)沉积在玻璃衬底上的。分别用X射线衍射仪(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)和微量分析(EDX)对其微观结构、形貌、透光率和化学成分进行了研究。利用阴极发光技术研究了薄膜的发光特性,并利用三次谐波产生技术研究了薄膜的三阶非线性磁化率。我们的研究目的是优化发光和非线性响应,以在光电子学中作为透明导电电极或微电子领域的可能应用。
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