Spectroscopic ellipsometry and reflectometry: a user's perspective

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI:10.1109/LEOSST.2000.869717

H. Tompkins, J. Baker, S. Smith, D. Convey

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引用次数: 3

Abstract

We discuss how analytical tools in a characterization lab can be used to enhance metrology tools in a fab. The emphasis is on the interaction between a characterization lab and a wafer fab belonging to the same industrial company. Specifically this work will deal with ex situ analysis rather than in situ metrology. A metrology tool in a fab must be clean, fast, simple to operate, and must be able to measure small features. A classical example is a reflectometry tool. On the other hand, a tool in a characterization lab can handle a much more complex sample, can take a significantly longer time for the analysis, and often has the luxury of using a blanket wafer. The analyst is also available for consulting with regard to optimum samples configuration in order to generate the information required. Our emphasis will be on using spectroscopic ellipsometry in a characterization lab to develop optical constants of unusual material so that this information can be used in a reflectometry tool in the fab.

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光谱椭偏和反射:用户的视角

我们讨论了如何使用表征实验室中的分析工具来增强晶圆厂中的计量工具。重点是表征实验室和属于同一工业公司的晶圆厂之间的相互作用。具体地说，这项工作将处理非原位分析，而不是原位计量。工厂中的计量工具必须干净、快速、操作简单，并且必须能够测量小的特征。一个典型的例子是反射测量工具。另一方面，表征实验室中的工具可以处理更复杂的样品，可以花费更长的时间进行分析，并且通常可以使用毯子晶圆。分析人员还可以就最佳样品配置进行咨询，以生成所需的信息。我们的重点将是在表征实验室中使用光谱椭偏法来开发不寻常材料的光学常数，以便这些信息可以用于晶圆厂的反射测量工具。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)

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