H. Gehring, M. Blaicher, Thomas Grottke, W. Pernice
{"title":"Reconfigurable nanophotonic circuitry enabled by direct-laser-writing","authors":"H. Gehring, M. Blaicher, Thomas Grottke, W. Pernice","doi":"10.1364/cleo_at.2021.jth3a.12","DOIUrl":null,"url":null,"abstract":"Passive integrated nanophotonic circuits mass-produced by lithographic means offer limited customizability after nanofabrication. Here we present an approach for reconfiguring nanophotonic circuitry after lithography by using direct-laser-writing for application-specific tasks.","PeriodicalId":384075,"journal":{"name":"2021 Conference on Lasers and Electro-Optics (CLEO)","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 Conference on Lasers and Electro-Optics (CLEO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/cleo_at.2021.jth3a.12","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Passive integrated nanophotonic circuits mass-produced by lithographic means offer limited customizability after nanofabrication. Here we present an approach for reconfiguring nanophotonic circuitry after lithography by using direct-laser-writing for application-specific tasks.