W. Sweatt, D. Tichenor, G. Kubiak, W. W. Chow, P. Rockett, R. Olson, T. Jewell, O. Wood, D. Windt, J. Bjorkholm, M. Himel, A. MacDowell
{"title":"Optical Design Issues for Soft-X-Ray Projection Lithography","authors":"W. Sweatt, D. Tichenor, G. Kubiak, W. W. Chow, P. Rockett, R. Olson, T. Jewell, O. Wood, D. Windt, J. Bjorkholm, M. Himel, A. MacDowell","doi":"10.1364/odp.1993.pd.1","DOIUrl":null,"url":null,"abstract":"A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.","PeriodicalId":296845,"journal":{"name":"Optical Design for Photonics","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Design for Photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/odp.1993.pd.1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.
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