Analytical and experimental optimization of external gate resistance for safe rapid turn on of normally off GaN HFETs

Ansel Barchowsky, J. P. Kozak, Michael R. Hontz, W. Stanchina, G. Reed, Z.-H. Mao, R. Khanna
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引用次数: 10

Abstract

This paper presents an analytical framework, supplemented with experimental validation, for optimizing the value of the external gate resistance employed in power conversion circuits using EPC enhancement-mode GaN transistors. A second order analytical model of the GaN device is utilized to determine a function that relates the external gate resistance to the peak gate voltage during turn-on. The results obtained from the analytical model were experimentally validated in a double pulse-test. The derived model allows for optimal selection of gate resistances such that GaN HFETs can be switched as rapidly as possible while keeping them in their safe operating region.
常关态氮化镓hfet安全快速导通外栅电阻的分析与实验优化
本文提出了一个分析框架,并辅以实验验证,用于优化使用EPC增强型GaN晶体管的功率转换电路中使用的外部栅极电阻值。利用氮化镓器件的二阶解析模型来确定导通期间外部栅极电阻与峰值栅极电压之间的函数。通过双脉冲试验验证了分析模型的结果。导出的模型允许栅极电阻的最佳选择,使得GaN hfet可以在保持其安全工作区域的同时尽可能快地切换。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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