Flexible Thin Film Transistor (TFT) and Circuits for Internet of Things (IoT) based on Solution Processed Indium Gallium Zinc Oxide (IGZO)

Sagar R. Bhalerao, D. Lupo, Paul R. Berger
{"title":"Flexible Thin Film Transistor (TFT) and Circuits for Internet of Things (IoT) based on Solution Processed Indium Gallium Zinc Oxide (IGZO)","authors":"Sagar R. Bhalerao, D. Lupo, Paul R. Berger","doi":"10.1109/IFETC49530.2021.9580506","DOIUrl":null,"url":null,"abstract":"Solution-processed metal oxide semiconductors are being extensively studied as a channel material for active semiconductor transistors. Among all metal oxide semiconductors, indium-gallium-zinc-oxide (IGZO) gained considerable attention for thin film transistors (TFTs) due to its promising electrical properties. Although metal oxide TFTs fabricated with vacuum deposition techniques enjoy the advantage of higher mobility in comparison with solution processing. However, vacuum deposition techniques are very costly due to expensive equipment, restricting its usage for emerging modern technologies, such as printed and flexible electronics. On the other hand, solution-processed metal oxide devices have an added advantage, such as low cost, compatibility with flexible substrates. Therefore, developments of solution processed metal oxide TFTs on flexible substrates could open a new era of flexible and wearable electronics. Herein, we report the fabrication of flexible thin film transistors (TFT) and inverter circuit using solution-processed indium-gallium-zinc-oxide as a channel material by uniting with room temperature deposited anodized high-K aluminium oxide (Al2O3) for gate dielectrics. The flexible TFTs operates at low voltage Vds of 4 V, with threshold voltage Vth 1.05 V along with hysteresis as low as 0.4 V. The extracted electron mobility (µ) at saturation regime, is 4.77 cm2/V.s. The transconductance, gm, is 90.8µS, subthreshold swing (SS) 357 mV/dec and on/off ratio 105.","PeriodicalId":133484,"journal":{"name":"2021 IEEE International Flexible Electronics Technology Conference (IFETC)","volume":"86 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IEEE International Flexible Electronics Technology Conference (IFETC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IFETC49530.2021.9580506","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Solution-processed metal oxide semiconductors are being extensively studied as a channel material for active semiconductor transistors. Among all metal oxide semiconductors, indium-gallium-zinc-oxide (IGZO) gained considerable attention for thin film transistors (TFTs) due to its promising electrical properties. Although metal oxide TFTs fabricated with vacuum deposition techniques enjoy the advantage of higher mobility in comparison with solution processing. However, vacuum deposition techniques are very costly due to expensive equipment, restricting its usage for emerging modern technologies, such as printed and flexible electronics. On the other hand, solution-processed metal oxide devices have an added advantage, such as low cost, compatibility with flexible substrates. Therefore, developments of solution processed metal oxide TFTs on flexible substrates could open a new era of flexible and wearable electronics. Herein, we report the fabrication of flexible thin film transistors (TFT) and inverter circuit using solution-processed indium-gallium-zinc-oxide as a channel material by uniting with room temperature deposited anodized high-K aluminium oxide (Al2O3) for gate dielectrics. The flexible TFTs operates at low voltage Vds of 4 V, with threshold voltage Vth 1.05 V along with hysteresis as low as 0.4 V. The extracted electron mobility (µ) at saturation regime, is 4.77 cm2/V.s. The transconductance, gm, is 90.8µS, subthreshold swing (SS) 357 mV/dec and on/off ratio 105.
基于溶液加工铟镓氧化锌(IGZO)的柔性薄膜晶体管(TFT)和物联网(IoT)电路
溶液加工的金属氧化物半导体作为有源半导体晶体管的沟道材料正受到广泛的研究。在所有金属氧化物半导体中,铟镓锌氧化物(IGZO)由于其具有良好的电学性能而在薄膜晶体管(TFTs)中引起了广泛的关注。虽然用真空沉积技术制备的金属氧化物tft与溶液工艺相比具有更高的迁移率。然而,由于设备昂贵,真空沉积技术非常昂贵,限制了其在新兴现代技术中的应用,如印刷和柔性电子。另一方面,溶液加工的金属氧化物器件具有额外的优点,例如低成本,与柔性基板兼容。因此,在柔性衬底上溶液加工金属氧化物tft的发展可以打开一个柔性和可穿戴电子产品的新时代。在这里,我们报道了用溶液处理的铟镓锌氧化物作为通道材料,结合室温沉积的阳极氧化高k氧化铝(Al2O3)作为栅极电介质,制造柔性薄膜晶体管(TFT)和逆变电路。柔性TFTs工作在4 V的低压Vds下,阈值电压Vth为1.05 V,迟滞低至0.4 V。在饱和状态下,提取的电子迁移率(µ)为4.77 cm2/V.s。跨导gm为90.8µS,亚阈值摆幅(SS)为357 mV/dec,开/关比为105。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信