Effects of Tolerance Fabrication of Extended Interaction Oscillator Based on Pseudospark-sourced Sheet Electron Beam at 0.35 THz

Abstract

A practical numerical approach to the analysis of the effects of tolerances fabrication on the performance of a planar 0.35 THz extended interaction oscillator (EIO) is presented. The planar EIO is to be driven by pseudospark-sourced sheet electron beam. The influence of tolerance on the $Q$-value, resonance frequency, characteristic impedance is demonstrated using an effective value of conductivity of 1.1 × 107 S/m to take into account the skin depth and surface roughness. The method of Wire Electrical Discharge Machining (WEDM) is proposed to manufacture the 0.35 THz EIO because of its precision and moderate cost compared with other manufacturing methods such as high speed micro machining, Deep Reactive Ion Etching (DRIE) or Ultra Violet Lithographie, Galvanik, and Abformung (UV LIGA).