Advanded Design Verification and Debugging Techniques Based on Optical Fault Isolation Method

Abstract

This paper introduces an effective design debugging and verification method using optical fault isolation (OFI) techniques. Although OFI is mainly used for failure analysis of semiconductor, key concepts of OFI techniques can be enlarged for circuit analysis of a real chip. Circuit analysis results on device skew of digital logic and pulse rejection filter of MIPI D-PHY core show that it is a very effective method to apply OFI to design verification at the early phase of production.