Investigation of Thermoelectric Properties for Ge2Sb2Te5 Thin Films Obtained by Magnetron Sputtering

D. V. Pepelyaev, Dmitriy Yu. Terekhov, I. Voloshchuk, A. Babich
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引用次数: 1

Abstract

In this work, thermoelectric properties of Ge2Sb2Te5 thin films obtained by magnetron sputtering were investigated. Deposition was carried out at room temperature, the thickness of the films was 500 nm. The resistivity, Seebeck coefficient and thermal conductivity of thin films were measured. The resistivity of as-deposited layers was about 3500 Ohm·cm and dropped sharply after annealing at a temperature of 260°C for 30 minutes, which is due to the phase transition of the material. The Seebeck coefficient for the as-deposited films was about 1000 μV/K, and the thermal conductivity was 0.16 W/(m·K). It has been established that the highest power factor of 0.13 mW/(m·K2) have Ge2Sb2Te5 thin films heat treated at 260°C
磁控溅射制备Ge2Sb2Te5薄膜热电性能研究
本文研究了磁控溅射制备的Ge2Sb2Te5薄膜的热电性能。在室温下进行沉积,薄膜厚度为500 nm。测量了薄膜的电阻率、塞贝克系数和导热系数。沉积层的电阻率约为3500欧姆·cm,在260℃下退火30分钟后,电阻率急剧下降,这是由于材料的相变所致。沉积膜的Seebeck系数约为1000 μV/K,导热系数为0.16 W/(m·K)。经260℃热处理后,Ge2Sb2Te5薄膜的功率因数最高,为0.13 mW/(m·K2)
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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