A. Joseph, A. Botula, J. Slinkman, R. Wolf, R. Phelps, M. Abou-Khalil, J. Ellis-Monaghan, S. Moss, M. Jaffe
{"title":"Power handling capability of an SOI RF switch","authors":"A. Joseph, A. Botula, J. Slinkman, R. Wolf, R. Phelps, M. Abou-Khalil, J. Ellis-Monaghan, S. Moss, M. Jaffe","doi":"10.1109/RFIC.2013.6569611","DOIUrl":null,"url":null,"abstract":"In this study, we define and investigate the maximum power handling capability (Pmax) in an SOI RF shunt branch switch. One of the critical factor in the Pmax is the non-uniform voltage division across an OFF shunt branch. In this study we provide a simple analytical method to determine the stack voltage imbalance. The Pmax is characterized as a function of various parameters, such as, switch stack height, channel length, Gate and Body bias, and process parameters. Overall, we find that the Pmax can be improved by reducing stack imbalance as well as device leakage currents, namely, GIDL.","PeriodicalId":203521,"journal":{"name":"2013 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFIC.2013.6569611","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15
Abstract
In this study, we define and investigate the maximum power handling capability (Pmax) in an SOI RF shunt branch switch. One of the critical factor in the Pmax is the non-uniform voltage division across an OFF shunt branch. In this study we provide a simple analytical method to determine the stack voltage imbalance. The Pmax is characterized as a function of various parameters, such as, switch stack height, channel length, Gate and Body bias, and process parameters. Overall, we find that the Pmax can be improved by reducing stack imbalance as well as device leakage currents, namely, GIDL.