{"title":"Planar Resistors for Probe Station Calibration","authors":"D. Walker, D.F. Williams, J. M. Morgan","doi":"10.1109/ARFTG.1992.326993","DOIUrl":null,"url":null,"abstract":"This paper investigates the effects of variations in sheet resistance, geometry, distance from the probe tip, and fabrication processes on the impedance of planar nickel-chromium resistors. Resistor reactance is a strong function of film resistance, but depends only weakly on geometry and distance from the probe tip. Photoresist contamination in the resistive film induces more complicated impedance behavior, even at low frequencies. The impact on circuit design and time- and frequency-domain calibrations is considered in light of these results.","PeriodicalId":130939,"journal":{"name":"40th ARFTG Conference Digest","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"30","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"40th ARFTG Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ARFTG.1992.326993","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 30
Abstract
This paper investigates the effects of variations in sheet resistance, geometry, distance from the probe tip, and fabrication processes on the impedance of planar nickel-chromium resistors. Resistor reactance is a strong function of film resistance, but depends only weakly on geometry and distance from the probe tip. Photoresist contamination in the resistive film induces more complicated impedance behavior, even at low frequencies. The impact on circuit design and time- and frequency-domain calibrations is considered in light of these results.