A process variation compensating technique for sub-90 nm dynamic circuits

Abstract

A process variation compensating technique for dynamic circuits is described for sub-90 nm technologies where leakage variation is severe. A keeper whose effective strength is optimally programmable based on die leakage enables 10% faster performance, 35% reduction in delay variation, and 5x reduction in robustness failing dies over conventional static keeper design in 90 nm dual-V/sub t/ CMOS.