Ultrafast charge transfer and recombination dynamics at the monolayer-multilayer WSe2 homojunction revealed by time-resolved photoemission electron microscopy
Xu Ce, S. B. Natalie, He Jinlu, Long Run, R. C. Alisson, Paradisanos Ioannis, K. O. Anna, Soavi Giancarlo, Tongay Sefaattin, C. Giulio, C. Andrea, V. P. Oleg, Loh Zhi-Heng
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引用次数: 0
Abstract
Transition metal dichalcogenides (TMDs) have rapidly emerged as one of the most attractive families of two-dimensional materials due to their numerous outstanding electronic and optoelectronic properties. TMDs have layer-dependent band structures, exhibiting a dramatic transition from a direct bandgap in the monolayer (1L) to an indirect bandgap in the multilayer ( N L). TMD homojunctions form when a 1L TMD interfaces with an N L TMD of the same chemical composition. Such 1L/ N L TMD homojunctions are predicted to have similar properties as heterojunctions, which comprises two different TMDs. In this work, we employ time-resolved photoemission electron microscopy (TR-PEEM) to study the ultrafast carrier dynamics of a WSe 2 1L/ N L Type-I homojunction with high temporal (50 fs) and spatial (70 nm) resolution. Analysis of the TR-PEEM signal obtained from the individual components of the homojunction reveals timescales for carrier cooling and exciton-exciton annihilation. Beyond the carrier dynamics confined to the individual components of the homojunction, the TR-PEEM image also revealed the accumulation of holes at the interface of the homojunction; the width of the depletion zone is found to be 0.60 ± 0.17 µ m. Finally, TR-PEEM reveals electron-hole recombination across the homojunction with a time constant of 108 ± 9 ps. These results shed light on the ultrafast carrier dynamics of TMD homojunctions.
过渡金属二硫族化合物(TMDs)由于其众多突出的电子和光电子特性而迅速成为最具吸引力的二维材料家族之一。TMD具有层依赖的能带结构,表现出从单层(1L)的直接带隙到多层(N L)的间接带隙的戏剧性转变。当1L TMD与具有相同化学成分的N L TMD界面时,TMD形成同质结。这种1L/ nl TMD同质结被预测具有与异质结相似的性质,异质结由两种不同的TMD组成。在这项工作中,我们使用时间分辨光电发射电子显微镜(TR-PEEM)研究了具有高时间(50 fs)和空间(70 nm)分辨率的WSe 2 1L/ N L i型同结的超快载流子动力学。对从同结各组分获得的TR-PEEM信号的分析揭示了载流子冷却和激子-激子湮灭的时间尺度。除了局限于同质结各组分的载流子动力学外,TR-PEEM图像还显示了同质结界面上空穴的积累;最后,通过TR-PEEM分析,发现TMD同质结的电子-空穴复合时间常数为108±9 ps,揭示了TMD同质结的超快载流子动力学。