Study on Metal Film Formation by Large-area Electron Beam Irradiation

Abstract

Recently, many surfacing processes, such as coating have been widely applied to the industrial products in order to improve the surface functions. One of the practical surfacing processes is a sputter deposition, in which the sputtered target material is deposited on the substrate surface. This method can be used not only for metals but also for insulators and plastics materials as substrate surface. In this study, the possibility of sputter deposition by using a large-area electron beam was discussed. If the target material deposits on the substrate surface simultaneously with the surface melting and resolidification of substrate material by large-area EB, the adhesion between the deposited film and the substrate surface would be strong. Alloy tool steel SKD11 was used as a substrate material, and pure metal tube made of nickel or titanium were used as a target material. Then, the substrate surface after EB irradiation was analyzed and the surface characteristics were investigated.