Surface structure formation by means of plasma oscillations. Numerical simulation and the principal regularities

Abstract

Numerical simulation of a new method proposed previously for plasma deposition allowing creation of the unique surface structures was carried out. The primary mechanisms were studied and the surface structures were calculated. The present paper describes: model of numerical simulation and conditions of digitization, the set of surface structures calculated, boundary conditions, numerical studying of an electrical field distribution in the oscillation area, numerically calculated ion traces and distribution of ion precipitation to the substrate under plasma oscillation area. The investigation proposed contains the recommendations with respect to experimental investigations being planned, and possible advantages of a new technique for complex surface structure formation with no mask used.