Short circuit capability and high temperature channel mobility of SiC MOSFETs

Jiahui Sun, Hongyi Xu, Xinke Wu, Shu Yang, Qing Guo, Kuang Sheng
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引用次数: 38

Abstract

Short circuit capability of a 1200V SiC MOSFET and a 1200V Si IGBT is compared and analyzed in this work, and the channel mobility in the SiC MOSFET over a broad temperature range from room temperature up to 2000 °C has been extracted for the first time. Experimental results show that SiC MOSFET exhibits shorter short circuit withstand time (SCWT) compared to Si IGBT. 1-D transient finite element thermal models of SiC MOSFETs and Si IGBTs have been implemented to simulate the dynamic temperature profiles in devices during short circuit tests. The junction temperature of SiC MOSFET rises much faster than that of Si IGBT and the heat spreading thickness of SiC MOSFET is much narrower, leading to shorter SCWT of the SiC MOSFET. Combining the experimental and thermal simulation results, the temperature-dependent saturation drain current in SiC MOSFETs is extracted. Based on this, the channel mobility over a wide temperature range is obtained.
SiC mosfet的短路性能和高温通道迁移率
本文对1200V SiC MOSFET和1200V Si IGBT的短路性能进行了比较和分析,并首次提取了SiC MOSFET在室温至2000°C的宽温度范围内的沟道迁移率。实验结果表明,SiC MOSFET比Si IGBT具有更短的耐短路时间(SCWT)。建立了SiC mosfet和Si igbt的一维瞬态有限元热模型,用于模拟器件在短路测试过程中的动态温度分布。SiC MOSFET的结温上升速度比Si IGBT快得多,且SiC MOSFET的散热厚度窄得多,导致SiC MOSFET的SCWT较短。结合实验和热仿真结果,提取了SiC mosfet中温度相关的饱和漏极电流。在此基础上,获得了宽温度范围内的通道迁移率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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