Organic semiconductor rubrene thin films deposited by pulsed laser evaporation of solidified solutions

N. Majewska, M. Gazda, R. Jendrzejewski, S. Majumdar, M. Sawczak, G. Śliwiński
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引用次数: 2

Abstract

Organic semiconductor rubrene (C42H28) belongs to most preferred spintronic materials because of the high charge carrier mobility up to 40 cm2(V·s)-1. However, the fabrication of a defect-free, polycrystalline rubrene for spintronic applications represents a difficult task. We report preparation and properties of rubrene thin films deposited by pulsed laser evaporation of solidified solutions. Samples of rubrene dissolved in aromatic solvents toluene, xylene, dichloromethane and 1,1-dichloroethane (0.23-1% wt) were cooled to temperatures in the range of 16.5-163 K and served as targets. The target ablation was provided by a pulsed 1064 nm or 266 nm laser. For films of thickness up to 100 nm deposited on Si, glass and ITO glass substrates, the Raman and AFM data show presence of the mixed crystalline and amorphous rubrene phases. Agglomerates of rubrene crystals are revealed by SEM observation too, and presence of oxide/peroxide (C42H28O2) in the films is concluded from matrix-assisted laser desorption/ionization time-of-flight spectroscopic analysis.
脉冲激光蒸发固化溶液沉积有机半导体rubrene薄膜
有机半导体rubrene (C42H28)的载流子迁移率高达40 cm2(V·s)-1,是最受欢迎的自旋电子材料。然而,制造一种无缺陷的多晶rubrene用于自旋电子应用是一项艰巨的任务。本文报道了用脉冲激光蒸发固化溶液沉积rubrene薄膜的制备及其性能。将溶解在芳香溶剂甲苯、二甲苯、二氯甲烷和1,1-二氯乙烷(0.23-1% wt)中的rubrene样品冷却至16.5-163 K的温度范围内,作为靶。靶烧蚀采用脉冲1064 nm或266 nm激光。对于厚度达100 nm的薄膜沉积在硅,玻璃和ITO玻璃衬底上,拉曼和AFM数据显示存在混合晶体和非晶rubrene相。扫描电镜(SEM)观察了rubrene晶体的团聚,基质辅助激光解吸/电离飞行时间光谱分析表明薄膜中存在氧化物/过氧化物(C42H28O2)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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