The influence of the gate leakage current and the gate resistance on the noise and gain performances of 90-nm CMOS for micro- and millimeter-wave frequencies

H. Vickes, M. Ferndahl, A. Masud, H. Zirath
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引用次数: 11

Abstract

We report the experimental and theoretical evaluation of the noise and the high frequency gain performances applied to a very short channel 90-nm CMOS transistor. We show that gate leakage currents modify the behavior of the noise parameters Rn, Fmin and Zopt only in the low gigahertz range. The gate resistance, Rg, on the contrary, have influence on the noise performance over the complete frequency range. Noise parameters have been measured in the frequency range 2-26 GHz and the S-parameters have been measured up to 62.5 GHz. The proposed model has been used in the design of a 2-stage 40 GHz amplifier.
在微毫米波和毫米波频率下,栅极漏电流和栅极电阻对90纳米CMOS噪声和增益性能的影响
我们报告了应用于极短通道90纳米CMOS晶体管的噪声和高频增益性能的实验和理论评估。我们发现栅极泄漏电流仅在低千兆赫范围内改变噪声参数Rn, Fmin和Zopt的行为。相反,栅极电阻Rg对整个频率范围内的噪声性能有影响。在2 ~ 26ghz频率范围内测量了噪声参数,在62.5 GHz频率范围内测量了s参数。该模型已用于一个2级40ghz放大器的设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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