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Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

International Conference on Extreme Ultraviolet Lithography 2022 Pub Date : 2022-10-31 DOI:10.1117/12.2643047
Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Min-Woo Kim, Junhyeong Lee, Hye-Ceol Oh
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由于EUV照射下不同的吸热，可能导致下层依赖CD和覆盖层的变化
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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International Conference on Extreme Ultraviolet Lithography 2022
International Conference on Extreme Ultraviolet Lithography 2022
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