{"title":"Tellurite glass microcavity resonators integrated on a silicon photonics platform","authors":"H. Frankis, Dawson B. Bonneville, J. Bradley","doi":"10.1117/1.JOM.1.2.024002","DOIUrl":null,"url":null,"abstract":"Abstract. We report on the design and measurement of tellurium oxide microcavity resonators coupled to silicon bus waveguides on silicon photonic chips. The resonators are fabricated using a standard silicon photonics foundry processing flow in which the SiO2 top-cladding is etched in a ring shape and aligned next to a silicon bus waveguide. The resulting microtrench is coated in a tellurium oxide film by reactive sputtering in a post-processing step to form the waveguiding layer of the resonator. A 100-μm radius trench with a 1115-nm-thick TeO2 film is measured to have an internal Q factor of 0.9 × 105. Smoothing the etch wall surface with a fluoropolymer coating is shown to enhance the Q factor of several devices, with a trench coated in a 630-nm-thick TeO2 film demonstrating a Q factor of 2.1 × 105 corresponding to 1.7-dB/cm waveguide loss. These results demonstrate a potential pathway toward monolithic integration of tellurite glass-based nonlinear and rare-earth-doped devices compatible with silicon photonics platforms.","PeriodicalId":127363,"journal":{"name":"Journal of Optical Microsystems","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-03-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Optical Microsystems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.JOM.1.2.024002","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Abstract. We report on the design and measurement of tellurium oxide microcavity resonators coupled to silicon bus waveguides on silicon photonic chips. The resonators are fabricated using a standard silicon photonics foundry processing flow in which the SiO2 top-cladding is etched in a ring shape and aligned next to a silicon bus waveguide. The resulting microtrench is coated in a tellurium oxide film by reactive sputtering in a post-processing step to form the waveguiding layer of the resonator. A 100-μm radius trench with a 1115-nm-thick TeO2 film is measured to have an internal Q factor of 0.9 × 105. Smoothing the etch wall surface with a fluoropolymer coating is shown to enhance the Q factor of several devices, with a trench coated in a 630-nm-thick TeO2 film demonstrating a Q factor of 2.1 × 105 corresponding to 1.7-dB/cm waveguide loss. These results demonstrate a potential pathway toward monolithic integration of tellurite glass-based nonlinear and rare-earth-doped devices compatible with silicon photonics platforms.