T. Powell, Nishchay H. Sule, S. Hemmady, P. Zarkesh-Ha
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引用次数: 3
Abstract
This paper presents an analytical model to predict and characterize the impact of Extreme Electromagnetic Interference (EEMI) on Voltage Transfer Characteristic (VTC) of CMOS inverters as a function of device scale. The predictive model determines the slope of VTC based on only a few primitive technology parameters. The developed analytical model is successfully compared against measurement data from a CMOS inverter fabricated using TSMC's 350nm standard CMOS process. Based on the predictive model the tolerance to EEMI injected power in a CMOS inverter reduces by technology scaling, starting from 14dBm at 350nm down to 3.5dBm at 65nm technology node.