The discharged characteristics of capacitively coupled Ar/N2 plasma driven by the dual frequency 8 / 100 MHz

Yin Guiqin; Zhou Youyou; Yuan Qianghua
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Abstract

The discharged characteristics of capacitively coupled Ar/N2 plasma driven by 8 MHz and 100 MHz are investigated at low pressure. The mean electron temperatures at central plasma area are discussed by the corona model with the high frequency (HF) power increase (low frequency (LF) power is fixed) and argon increase. The second positive system (SPS) of nitrogen molecular (C3Πu→B3Πg) from 370 nm to 410 nm in the N2 optical emission spectrum is used to calculate the rotational and vibrational temperature of nitrogen molecular. These results show that the mean electron temperatures both decrease with the argon increase and the HF power increase. The rotational temperature increase with argon increase and decrease with the HF power increase. The particle-in-cell/Monte Carlo (PIC/MC) method is used to calculate the ion density, electron temperature and electron energy probability function (EEPF) according to experimental conditions. These results show that the electron temperatures both decrease with HF power increase and argon content increase, which are agreed with the spectral results. The EEPF show that the low and high energy electrons both increase with the HF power increase and argon increase. The energy exchange by these higher energy electrons is large, which result in the decrease of electron temperatures.
研究了8 / 100 MHz双频驱动电容耦合Ar/N2等离子体放电特性
研究了8mhz和100mhz驱动下电容耦合Ar/N2等离子体在低压下的放电特性。用电晕模型讨论了高频功率增加(低频功率固定)和氩气增加时等离子体中心区域的平均电子温度。氮分子(C3Πu→B3Πg)在N2光发射光谱370 ~ 410 nm范围内的第二正体系(SPS)用于计算氮分子的旋转和振动温度。结果表明,平均电子温度随氩浓度的增加和HF功率的增加而降低。旋转温度随氩气的增加而升高,随高频功率的增加而降低。根据实验条件,采用粒子池/蒙特卡罗(PIC/MC)方法计算离子密度、电子温度和电子能量概率函数(EEPF)。结果表明,随着HF功率的增加和氩含量的增加,电子温度均降低,这与光谱结果一致。EEPF结果表明,随着高频功率的增加和氩气的增加,低能电子和高能电子均增加。这些高能电子的能量交换很大,导致电子温度降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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