Simulation of GaN HEMT with wide-linear-range transconductance

Chenjie Tang, K. Teo, J. Shi
{"title":"Simulation of GaN HEMT with wide-linear-range transconductance","authors":"Chenjie Tang, K. Teo, J. Shi","doi":"10.1109/EDSSC.2017.8126442","DOIUrl":null,"url":null,"abstract":"This paper presents a simulation study to achieve wide-linear-range transconductance of T-gate GaN HEMTs by introducing a δ-doped layer and a p-GaN back barrier. With optimized δ-doping density and location, the transconductance (g<inf>m</inf>) and current gain cutoff frequencies (f<inf>T</inf>) are ultra-flat and remain close to their peak values over a wide range of gate-source voltages (Vgs). In addition, a smaller absolute g<inf>m3</inf> (third-order derivative of the I<inf>ds</inf>-V<inf>gs</inf> curve) over a wide range of V<inf>gs</inf> is obtained in proposed HEMTs. These features are valuable in designing highly linear RF AlGaN/GaN HEMTs.","PeriodicalId":163598,"journal":{"name":"2017 International Conference on Electron Devices and Solid-State Circuits (EDSSC)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 International Conference on Electron Devices and Solid-State Circuits (EDSSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2017.8126442","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

This paper presents a simulation study to achieve wide-linear-range transconductance of T-gate GaN HEMTs by introducing a δ-doped layer and a p-GaN back barrier. With optimized δ-doping density and location, the transconductance (gm) and current gain cutoff frequencies (fT) are ultra-flat and remain close to their peak values over a wide range of gate-source voltages (Vgs). In addition, a smaller absolute gm3 (third-order derivative of the Ids-Vgs curve) over a wide range of Vgs is obtained in proposed HEMTs. These features are valuable in designing highly linear RF AlGaN/GaN HEMTs.
宽线性跨导GaN HEMT的仿真
本文提出了一种通过引入δ掺杂层和p-GaN背势垒来实现t栅GaN hemt宽线性跨导的仿真研究。通过优化δ掺杂密度和位置,跨导(gm)和电流增益截止频率(fT)在极宽的栅极源电压(Vgs)范围内保持在峰值附近。此外,在广泛的Vgs范围内,所提出的hemt获得了较小的绝对gm3 (Ids-Vgs曲线的三阶导数)。这些特性在设计高线性RF AlGaN/GaN hemt时很有价值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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