Influence of Ta buffer layer thickness on magnetic properties and microstructure parameters of CoFeB and MgO layers

J. Kanak, J. Wrona, M. Banasik, A. Żywczak, W. Powroźnik, M. Czapkiewicz, T. Stobiecki
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Abstract

This study discusses the influence of Ta buffer layer thickness on magnetic and structural parameters of a Ta-Co40Fe40B20-MgO-Ta magnetic tunnel junction (MTJ). The MTJ is deposited on thermally oxidized Si(001) substrates and annealed at 330°C for 20 min. Atomic force microscopy and X-ray diffraction are used to investigate the microstructure and surface roughness while vibrating sample magnetometry is employed to determine the magnetic moment, perpendicular magnetic anisotropy, and coercivity.
Ta缓冲层厚度对CoFeB和MgO层磁性能和显微结构参数的影响
研究了Ta缓冲层厚度对Ta- co40fe40b20 - mgo -Ta磁性隧道结(MTJ)磁性和结构参数的影响。将MTJ沉积在热氧化Si(001)衬底上,并在330°C下退火20 min。利用原子力显微镜和x射线衍射研究其微观结构和表面粗糙度,并用振动样品磁强计测定其磁矩、垂直磁各向异性和矫顽力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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