M. Charef, F. Dessenne, J. Thobel, Laurent Baudry, R. Fauquembergue
{"title":"The Influence of Technological Parameters on Ultra-Short Gate SI-NMOS Transistor Performances","authors":"M. Charef, F. Dessenne, J. Thobel, Laurent Baudry, R. Fauquembergue","doi":"10.1007/978-3-7091-6657-4_75","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":162419,"journal":{"name":"ESSDERC '93: 23rd European solid State Device Research Conference","volume":"72 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSDERC '93: 23rd European solid State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/978-3-7091-6657-4_75","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}