Positive-tone photodefinable polyimide for low temperature cure

Abstract

Photodefinable Polyimides (PI) and polybenz-oxazoles (PBO) which have been widely used for various electronic applications such as buffer coating, interlayer dielectric and protection layer usually need high temperature cure condition over 300 °C to complete the cyclization and achieve good film properties. In addition, PI and PBO are also utilized recently for re-distribution layer of wafer level package. In this application, lower temperature curability is strongly required in order to prevent the thermal damage of the semi-conductor device and the other packaging material. Then, to meet this requirement, we focused on pre-cyclized polyimide with phenolic hydroxyl groups since this polymer showed the good solubility to aqueous TMAH and there was no need to apply high temperature cure condition. As a result of our study, the positive-tone photodefinable material could be obtained by using DNQ and combination of epoxy cross-linker enabled to enhance the chemical and PCT resistance of the cured film made even at 170 °C. Furthermore, the adhesion to copper was improved probably due to secondary hydroxyl groups which were generated from reacted epoxide groups. In this report, we introduce our concept of novel photodefinable positive-tone polyimide for low temperature cure.