Piezoelectric films of AlN grown by reactive high-frequency magnetron sputtering

A. Belyanin, A. Bagdasarian, S. Nalimov
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Abstract

For the manufacture of electronic devices, layered structures based on substances characterized by a complex of unique properties are promising. These substances include AlN, which has the property of field emission, is a piezoelectric and wide-gap semiconductor material and has high hardness, thermal conductivity, sound speed, stability at high temperatures. To create microwave acoustoelectronic devices, AlN is promising as a piezoelectric material with a strong piezoelectric effect. The main factor determining the achievement and reproducibility of the necessary physicochemical properties of AlN films, in particular, piezoelectric ones, is the ordered structure of the film. To solve the problem of producing films with an ordered atomic structure, sputtering methods are promising, in particular, magnetron sputtering, the application of which has no restrictions on the synthesis temperature and requirements for the substrate material. The disadvantage of growing films by magnetron sputtering is the production of multiphase material, which requires careful refinement of the synthesis conditions and control of the properties of the resulting substances. The method of reactive RF magnetron sputtering on substrates of amorphous and crystalline materials grown AlN films with a thickness of 10 nm to 10 μm. It was established that AlN films consist of X-ray-amorphous and axially textured <0001> crystalline phases. Using electron microscopy, X-ray diffractometry, energy dispersive spectroscopy, and Raman spectroscopy, we studied the influence of synthesis conditions on the composition and structure of AlN films. The Raman spectra of light of AlN films with different contents and structure of the crystalline phase are shown. The piezoelectric efficiency of the films was determined on the models of delay lines on surface acoustic waves. Understanding the features of crystallization and phase transformations during film growth by spraying methods helps to create layered structures with controlled values of functional properties and operational characteristics. The ability to control the piezoelectric efficiency of AlN films by Raman spectra is shown.
反应性高频磁控溅射制备AlN压电薄膜
对于电子器件的制造,基于具有独特性质复合物的物质的层状结构是有前途的。这些物质包括AlN,它具有场发射特性,是一种压电和宽间隙半导体材料,具有高硬度、导热性、声速、高温稳定性。在制造微波声电子器件方面,氮化铝作为一种具有强压电效应的压电材料是很有前途的。决定氮化铝薄膜(特别是压电薄膜)所需物理化学性质的实现和再现性的主要因素是薄膜的有序结构。为了解决生产具有有序原子结构的薄膜的问题,溅射方法是有前途的,特别是磁控溅射,其应用不受合成温度和对衬底材料要求的限制。磁控溅射生长薄膜的缺点是生产多相材料,这需要仔细改进合成条件和控制所得物质的性质。采用反应射频磁控溅射的方法,在非晶和结晶材料的衬底上生长出厚度为10 nm ~ 10 μm的AlN薄膜。结果表明,AlN薄膜由x射线非晶相和轴向织构相组成。利用电子显微镜、x射线衍射、能量色散光谱和拉曼光谱研究了合成条件对氮化铝薄膜组成和结构的影响。给出了不同含量和不同晶相结构的氮化铝薄膜的拉曼光谱。利用表面声波上的延迟线模型确定了薄膜的压电效率。通过喷涂方法了解薄膜生长过程中的结晶和相变特征,有助于创建具有功能特性和操作特性可控值的层状结构。利用拉曼光谱对氮化铝薄膜的压电效率进行了控制。
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