Influence of Thermal Treatment of Sol-Gel Derived (Ca0.8Sr0.2)ZrO3 Dielectric Thin Films

Cheng-Hsing Hsu, Po-Yu Chou, C. Tseng
{"title":"Influence of Thermal Treatment of Sol-Gel Derived (Ca0.8Sr0.2)ZrO3 Dielectric Thin Films","authors":"Cheng-Hsing Hsu, Po-Yu Chou, C. Tseng","doi":"10.23919/AM-FPD.2019.8830616","DOIUrl":null,"url":null,"abstract":"Effect of thermal treatment on microstructures and electrical properties of the sol-gel derived (Ca0.8Sr0.2)ZrO3 thin films were investigated. The diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. Scanning electron microscopy results show that the grain size are found to be dependent on the annealing temperature. Based on the surface structure and morphological characteristics, the thin films were sensitive to deposition conditions, such as the preheating temperature and annealing temperature. At a preheating temperature of 400°C and an annealing temperature of 700°C, the (Ca0.8Sr0.2)ZrO3 film observes a dielectric constant of 24 (f = 1 MHz), a dissipation factor of 0.21 (f = 1 MHz), and a leakage current density of 3.8×10−9 A/cm2 at an electrical field of 10 kV/cm.","PeriodicalId":129222,"journal":{"name":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD.2019.8830616","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Effect of thermal treatment on microstructures and electrical properties of the sol-gel derived (Ca0.8Sr0.2)ZrO3 thin films were investigated. The diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. Scanning electron microscopy results show that the grain size are found to be dependent on the annealing temperature. Based on the surface structure and morphological characteristics, the thin films were sensitive to deposition conditions, such as the preheating temperature and annealing temperature. At a preheating temperature of 400°C and an annealing temperature of 700°C, the (Ca0.8Sr0.2)ZrO3 film observes a dielectric constant of 24 (f = 1 MHz), a dissipation factor of 0.21 (f = 1 MHz), and a leakage current density of 3.8×10−9 A/cm2 at an electrical field of 10 kV/cm.
热处理对溶胶-凝胶衍生(Ca0.8Sr0.2)ZrO3介电薄膜的影响
研究了热处理对溶胶-凝胶法制备的(Ca0.8Sr0.2)ZrO3薄膜微观结构和电学性能的影响。衍射图表明,沉积膜具有多晶结构。扫描电镜结果表明,晶粒尺寸与退火温度有关。基于表面结构和形态特征,薄膜对沉积条件(如预热温度和退火温度)敏感。在400℃预热和700℃退火条件下,(Ca0.8Sr0.2)ZrO3薄膜在10 kV/cm电场下介电常数为24 (f = 1 MHz),耗散系数为0.21 (f = 1 MHz),漏电流密度为3.8×10−9 a /cm2。
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