Radiation effect of X-ray with 100 kGy dose on the electrical properties of MESFET based on hydrogen-terminated diamond surface conductivity

IF 5.6
Mingchao Yang, T. Shimaoka, L. Sang, J. Kaneko, S. Koizumi, M. Liao
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Abstract

Abstract The irradiation effect of X-ray on the electrical properties of Schottky-barrier diode (SBD) and metal-semiconductor field-effect transistors (MESFET) based on the surface conductivity of hydrogen-terminated single-crystal diamond (SCD) epilayers was investigated. The Ohmic contact was formed by a Pd/Ti/Au multilayer and the Schottky metal was Al thin film for the fabrication of the diamond SBDs and MESFETs. The X-ray irradiation was performed with a dose of 100 kGy. It was observed that both the forward current of the SBDs and the drain current of the MESFETs experienced a reduction after the X-ray irradiation. The type of the single-crystal diamond substrate had an obvious effect on the radiation properties. For the MESFETs on the type-Ib SCD substrate, the variation of the drain currents as the irradiation was inhomogeneous across the devices. For the MESFETs on the type-IIa SCD substrate, the reduction of the drain currents is more uniform and the threshold voltage changed little upon X-ray irradiation. The partial oxidation in the air of the exposure area in the device and the edge of the Al gate may be responsible for the degradation of the device performance under X-ray irradiation. The passivation technique with radiation-robustness is needed for diamond devices based on the surface conductivity of diamond.
100 kGy剂量x射线辐射对端氢金刚石表面电导率MESFET电性能的影响
研究了基于端氢单晶金刚石(SCD)薄膜表面电导率的x射线辐照对肖特基势垒二极管(SBD)和金属半导体场效应晶体管(MESFET)电性能的影响。欧姆接触由Pd/Ti/Au多层膜形成,肖特基金属是用于制造金刚石sdd和mesfet的Al薄膜。x射线照射剂量为100 kGy。结果表明,经过x射线辐照后,sdd的正向电流和mesfet的漏极电流均有所减小。单晶金刚石衬底的类型对辐射性能有明显的影响。对于ib型SCD衬底上的mesfet,漏极电流随辐照在器件上的变化是不均匀的。对于iia型SCD衬底上的mesfet,漏极电流的减小更为均匀,阈值电压在x射线照射下变化不大。在x射线照射下,器件暴露区域和铝栅边缘空气中的部分氧化可能是器件性能下降的原因。基于金刚石的表面电导率,金刚石器件需要具有辐射鲁棒性的钝化技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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