The Mathematical Model of Arc Discharge in Metal Vapors at Active Gases over Crucible for Technological Process of Electron Beam Deposition of Ceramic Coatings

Nano Particle Pub Date : 2022-01-10 DOI:10.35702/nano.10007
I. Melnyk, V. Melnyk, S. Tuhai, I. Shved, D. Kovalchuk
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Abstract

The mathematical model of arc discharge in the metal vapors, propagated in the soft vacuum in the medium of active gases, is presented in this chapter. Such type of discharge is widely used in advanced electron beam technologies for obtaining the coating of new types from nanostructurized materials, especially ceramics coating. As electron beam sources for evaporation of refractory metals in this technological process the high voltage glow discharge electron guns are widely and effectively used. But the aim of applying of additional low-voltage arc discharge under the crucible is stimulating and maintaining the chemical reactions between metal vapors and residual gas in the vacuum technological chamber. In formed model for calculation of electric field distribution the analytical solving of Poisson equation is used, and the spatial distribution of discharge current density is defined on the base of the equation of uncontineously of electrons and ions flows. All analytical relations for auxiliary geometry of electrodes system with of electron beam technologies for obtaining different types of nanostructurized ceramics coatings.
电子束沉积陶瓷涂层工艺过程中活性气体金属蒸气电弧放电的数学模型
本文建立了金属蒸气在软真空中在活性气体介质中传播电弧放电的数学模型。这种类型的放电被广泛应用于先进电子束技术中,用于从纳米结构材料,特别是陶瓷涂层中获得新型涂层。高压辉光放电电子枪作为该工艺过程中难熔金属蒸发的电子束源得到了广泛而有效的应用。而坩埚下附加低压电弧放电的目的是刺激和维持真空工艺室内金属蒸气与残余气体之间的化学反应。在建立的电场分布计算模型中,采用泊松方程的解析解,在电子和离子不连续流动方程的基础上定义了放电电流密度的空间分布。利用电子束技术获得不同类型的纳米陶瓷涂层,分析了电极系统的辅助几何关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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