Design of High-Quality Factor Active Indictor Using CMOS 0.18-μm Technology for 5G Applications

H.A.A AlShaikh Ali, S. Murad, A. F. Hasan, F. A. Bakar, R. Sapawi
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引用次数: 0

Abstract

This paper presents high quality factor of active inductor circuit for 5G application. The proposed circuit is based on the differential active inductor (DAI) topology. The DAI is designed using CMOS 0.18 μm technology. The quality factor (Q) can be tuned with the current source values, ranging from 0.5 mA to 3 mA, while the voltage can control the inductance values L. Meanwhile, the frequency range can be controlled with the feedback resistance. The simulation results indicate that the Q factor as large as 262.5k can be achieved with inductor values of 10 nH at frequency 3.2 GHz. In addition, the Q factor of 1650 is obtained at 3.5 GHz. The performance comparison with previously published works is also demonstrated and found that the proposed DAI is suitable for 5G application.
基于CMOS 0.18-μm技术的5G高品质因数有源指示器设计
本文介绍了5G应用中有源电感电路的高品质因数。该电路基于差分有源电感(DAI)拓扑结构。DAI采用CMOS 0.18 μm工艺设计。质量因数Q可以用电流源的0.5 mA到3ma的值来调节,电压可以控制电感值l,频率范围可以用反馈电阻来控制。仿真结果表明,在3.2 GHz频率下,电感值为10 nH时,Q因子可达262.5k。此外,在3.5 GHz时获得了1650的Q因子。与先前发表的作品进行性能比较,发现所提出的DAI适用于5G应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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