From atomic-scale interfaces - to new nanomaterials

Abstract

The problem of the synthesis of new type nanomaterials in the form of nanocoatings with subnanometric heterogeneity has been formulated. It has been presented an analysis of influences of physical vapor deposition in ultrahigh vacuum on the process of intermixing a film with a substrate, including the results, which has been obtained under the formation of transition metal – silicon interface. The generalization of the obtained experimental results allowed to develop an approach to the development of new nanocoatings with low-dimensional heterogeneity. The principles of constructing such low-dimensional nanocoatings, their properties and their possible applications are considered.